High-temperature continuous terahertz laser discharge at NovoFEL: parameters and applications

A stable point-like thermodynamically-equilibrium plasma with diameter of 1 mm, density of $3 \times 10^{17}$ $\mathrm{cm}^{-3}$, and temperature of 4-4.5 $\mathrm{eV}(\mathbf{4 6 0 0 0 - 5 2 0 0 0 ~ K})$ was obtained in a continuous Kr- N
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laser discharge at NovoFEL at an average radiation power of less than 200 W. Such plasma is a bright source of VUV radiation, and when its temperature reaches $10-12$ eV, it can be a bright source of EVUV radiation, necessary for modern photolithography.