Mo base superconducting materials prepared by multi-target reactive sputtering

With an aim of developing new types of superconducting materials, Mo-N films and Mo/Si multi-layered films were fabricated by reactive and two-target sputtering methods, respectively. The superconducting properties such as T
c
, H
c2
and J
c
were examined. The crystal structure of Mo-N films changed from bcc to fcc with increasing N
2
gas flow rate during sputtering and a homogeneous fcc Mo
2
N superconductor was obtained. On the other hand, the superconducting characteristics of the Mo/Si multi-layered film with a layer spacing 32.3 Å were confirmed to be similar to those of amorphous Mo-Si alloys except the occurrence of anisotropic vortex pinning.