Selective microelectrodeposition of Ni-Fe patterns

Ni-Fe patterns of reproducible high quality for integrated thin film heads can be made by selective microelectrodeposition. A Ni-Fe bath characterized by improved microthrowing and long bath operation time has been used for this technique. Precise replication of mask profile, uniformity of thickness and chemical composition, and favorable magnetic properties of the microstructures of varying size are significant features of the technique.