Contour Extraction Assists in Distinguishing Lithographic Hotspot

This paper proposes a contour extraction technique for detecting subpar photoresist in SEM wafer images. By focusing on the brightness of edges in the SEM images, our method identifies “pinch” hotspots of thinner photoresist, utilizing Canny edge detection for superior accuracy. This approach enhances efficiency in large-scale SEM image defect inspection, crucial for preventing fabrication issues.