Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source

The magnetron sputtering is used for obtaining getter films for synchrotron radiation source Siberian Circular Photon Source. Getter thin films are to be used inside straight sections of the storage ring. The main problem of this technique is overheating cathode. Storage ring has narrow aperture where heat removal would be difficult. Decreasing the cathode power leads to nonuniform getter thin film thickness, since it is highly dependent on cathode current density. One way to reduce temperature without sacrificing in uniformity of film thickness is to apply pulsed method. The idea behind the pulsed mode is to generate pulses, during which the pulse-width modulation signal is sent to the field-effect transistor gate and the current through gas-discharge cell is generated. The current is integrated using an inductance. The controller unit as well as PC application which implement this method were designed. First experiments show increased thickness uniformity of getter films compared to non-pulsed sputtering.