Deposition of Hydrogenated Amorphous Silicon Films on Stainless Steel Surfaces to Investigate Compatibility with High Concentration Oxidants

This paper analyzes hydrogenated amorphous silicon films on type 316L stainless steel substrates. Silicon films of different crystallinities are deposited onto the stainless steel surface using low-pressure chemical vapor deposition. The resulting samples are immersed in a high-concentration oxidant and hydrochloric acid for testing. Compared to samples without silicon films, those with silicon films show a 1.6% reduction in oxidant oxygen concentration. Additionally, the corrosion rate for stainless steel is reduced by 90%.