An Anti-Plasma Etching Film of Y2O3 Film

In this paper, we have presented our experiment results including (a) use a slowly thermal spray process deposition an yttrium oxide (Y
2
O
3
) film with thickness of
$200\ \mu\mathrm{m}$
on the aluminum alloy (AA6061). The image analysis showed that the porosity of Y
2
O
3
film can be reduced to less than 2%. The further aerosol deposition can be used filling the pores and can reduce the porosity of the film to less than 0.5%. This low-porosity Y
2
O
3
film will be able to meet the increasingly stringent requirements for surface coating protection of semiconductor vacuum chamber. (b) Compared the corrosion characterization in 3.5 wt. % NaCl solution between naked AA6061 and AA6061 with Y
2
O
3
coating, a high corrosion reactivity (
$\mathrm{I}_{\text{corr}}=10^{-3.3}\mathrm{A}/\text{cm}^{2}$
) of naked AA6061 then AA6061 with Y
2
O
3
coating (
$\mathrm{I}_{\text{corr}}=10^{-5.8}\mathrm{A}/\text{cm}^{2}$
). The corrosion reactivity of AA6061 with Y
2
O
3
is reduced by 316 times to a naked AA6061.