Novel Approach Utilizing APIMS Technology for Analyzing CO & H2 Impurities in Semiconductor UHP Gases: AM: Advanced Metrology

New techniques for instrumentation setup and mathematical calibrations have been developed for Atmospheric Pressure Ionization Mass Spectrometers (APIMS) pertaining specifically to the measurements of carbon monoxide and hydrogen impurities in semiconductor UHP bulk gas. This has led to improved detection limits and measurement accuracies of these impurities. Verification of sub-ppb levels of these impurities in semiconductor bulk gases results in increased yields for wafer production.