Effect of Process Parameters on Microstructure and Properties of ITO Films by Pulsed Magnetron Sputtering

Indium tin oxide (ITO) films are widely used in many fields such as flat panel display, solar cell, etc. In this study, DC and pulsed DC magnetron sputtering were used to deposit ITO on silicon substrates. The microstructure and properties of ITO films were studied at different deposition temperatures. Transmission electron microscope (TEM) and X-ray diffractometer (XRD) were used to investigate the changes in the microstructure of ITO films, while atomic force microscope (AFM) and scanning electron microscope (SEM) were used to characterize surface morphology and roughness. At the same time, four-point probe method explores the effects of structural change on the sheet resistance of ITO. In addition, ITO was deposited on the glass substrate to investigate the effects of changing deposition conditions on ITO transmittance.