Study on the Dispersing Effect and Mechanism of Labsa on SiO2 in an Alkaline Barrier Slurry

In chemical mechanical polishing (CMP) slurry, the introduction of oxidizers, corrosion inhibitors, and other components often leads to the aggregation of SiO
2
. In this paper, the dispersing effect and mechanism of anionic surfactants linear alkyl benzenesulfonic acid (LABSA) on colloidal silica in a weakly alkaline slurry for cobalt barrier layer were investigated by experimental and simulation methods. The results show that the doublelayer adsorption formed by a high concentration of deprotonated LABSA can effectively disperse SiO
2
particles.