Glancing Angle Deposition Systems and Hardware

Summary

Fundamental to achieving the techniques described in the previous five chapters is the GLAD apparatus. This chapter covers the required hardware and operating conditions to produce high‐quality GLAD films. An overview of the vacuum conditions specific to GLAD are described, with examples showing depositions under non‐ideal conditions. The physics of the vapour plume are discussed, along with the calibration factors required to reliably measure the growing film thickness using a quartz crystal microbalance. Recommended practices for calibrating and monitoring system process parameters are given. To assist in evaluating GLAD deposition algorithms for manufacturing, a method for calculating GLAD film thickness‐ and column orientation‐uniformity across different wafer sizes is given, with numerous examples for conventional deposition cases. Vendors for GLAD hardware and recommendations for monitoring substrate position are given. Finally, heating and cooling systems are described, increasing the range of materials and structures that may be successfully deposited by GLAD methods.