Modeling 2D Inductively Coupled Plasmas with Particle-in-Cell Simulations Using the VSim Code

Inductively Coupled Plasmas (ICPs) are extensively used for materials processing, particularly in the semiconductor industry [1]. A typical ICP has an external RF antenna that couples power into a low-pressure chamber, forming a plasma. Antennas used for this purpose are typically coils; the electrical current induces an azimuthal electric field in the chamber, heating electrons and ionizing gas through electron-impact collisions. ICPs generally operate at tens of mTorr and can generate plasma densities up to 1×10
¹⁸
m
⁻³
, Simulations of ICPs have been extensively done, typically using fluid-based models for the plasma species and a power deposition profile for the antenna [2]. For lower pressures, the assumptions in these models may break down, necessitating a fully-kinetic approach.