Reduction of Residual Stresses in Aluminum Oxide Films by Ion-Plasma Methods

The reasons for the appearance of residual stresses in multilayer thin-film structures are considered. The necessity to influence the roughness of thin-film coatings is substantiated, since the presence of roughness peaks causes the appearance of stress state concentrators. Ion-plasma processing of functional dielectric layers of a multilayer thin-film coating makes it possible to reduce their roughness. The results of this study of ion-plasma treatment of an aluminum oxide layer obtained by magnetron sputtering in vacuum are presented. Profilograms of the aluminum oxide coating surface before and after ion and plasma treatments were obtained. The analysis of profilograms was carried out and the effect of ion-plasma treatment on changes in the profile, roughness and morphology of the aluminum oxide coating on the surface of glass-ceramic substrates was evaluated.