AdaOPC 2.0: Enhanced Adaptive Mask Optimization Framework for Via Layers

Optical proximity correction (OPC) is a widely used technique to enhance the printability of designs in various foundaries. Recently, there has been a growing interest in using rigorous numerical optimization and machine learning to improve the robustness and efficiency of OPC. Our research focuses on developing a self-adaptive OPC framework that leverages the properties of pattern distribution and repetition in design layouts to optimize the correction process. We observe that different sub-regions in a design layer have varying pattern complexities, and many patterns repeat themselves throughout the layout. By exploiting these properties, we propose a framework that adaptively selects the most suitable OPC solvers from an extensible pool to optimize the correction process for each pattern based on its complexity. This approach allows for a co-optimization of speed and accuracy. Additionally, we introduce a graph-based dynamic pattern library that reuses optimized masks for repeated patterns, further accelerating the OPC flow. Our experimental results demonstrate a significant improvement in both performance and efficiency using our proposed framework.