Supply Waveform Effect on the Characteristics of RF Capacitively Coupled Plasma in Ar/H2 Mixture

In this work, we present an investigation of the supply waveform effects on the characteristics of RF capacitively coupled cold plasma in an Ar/H2 mixture, employing peaks and valleys waveform excitation within a reactor comprising two concentric hollow cylinders. Optimal cross sections for electron collisions with neutral atoms and molecules are chosen to account for significant reactions among reactive species. The kinetics of plasma species are described using a second-order fluid model. This study allows an understanding of the physical and chemical processes in Ar/H2 plasmas excited by the valley waveform and explores plasma properties as a function of the Argon fraction. Additionally, the characteristics of the plasma and its supply are studied as a function of the harmonic number at the end of this work. The results show that the self-bias voltage for valley waveform supply evolves in the opposite direction in comparison with the peaks waveform supply.