Reliability-Based Design Method for Phase Mask With Periodic Array of Tapered Slits

I propose a powerful reliability analysis approach for the efficient design optimization of a plasmonic phase mask based on extraordinary optical transmission. The fabrication tolerances which are unavoidable during manufacture of nanostructure are considered by assuming design variables as statistically distributed and probabilistic constraints. This useful approach can be applied to reliability-based design optimization of nanostructures to predict failure probabilities of device performances.