Pix2PixHD-Based Generation of SEM Image in the ETCH Domain by SEM Image of LITHO Domain

In semiconductor manufacturing, a forward etching process model that can accurately predict the pattern transformation from post-lithography (ADI) to post-etch (AEI) is greatly desired. However, current etching model is etch bias based, it is unable to offer rich information as the SEM image does for engineers to do wafer disposition. We propose an AEI image generation model using the Pix2PixHD. It can generate AEI images corresponding to ADI images. Experimental results demonstrate that our generated images achieve a SSIM of 96.7^% and a MSSIM of 94.2% when compared to AEI images. Therefore, Our method can generate AEI images with a high resolution of (1024, 1024) and meet the requirements of applications.