Multi Cycle and Material Deposition for Spatial Atomic Layer Deposition Process

Spatial Atomic Layer Deposition (sALD) offers a unique opportunity for localized deposition due to its physical separation and isolation of precursor and co-reagent dosing.
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However, although simple in theory, due to well-developed examples of sALD, in practice miniaturization of sALD requires substantial effort into the creation of suitable micro-nozzles.
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Uniquely, ATLANT 3D has developed proprietary sALD micronozzles, called microreactor Direct Atomic Layer Processing - μDALP™.