Si Nanowires-holes Arrays with Enhanced Wettability

Surface engineering has made substantial advances in recent years, owing to the demand for increased wetting qualities in a variety of applications. In this study, we describe a novel method for improving surface wettability by developing nanostructured silicon nanowires-holes Si (NWs-NHs) arrays. Two-beam laser interference lithography (LIL) was used to make patterns, and metal-assisted chemical etching (MACE) was used to produce Si (NWs-NHs) arrays. The development of hydrophobic Si nanostructures, which exhibit a higher hydrophobicity than bare Si, also increased the surface wettability. Using a scanning electron microscope (SEM), the surface shape and chemical composition of the created nanostructures were examined. Measurements of the contact angles were used to describe the wettability properties. This study exemplifies the potential of LIL and MACE approaches for the creation of Si nanostructures with distinctive features, which have applications in self-cleaning surfaces, anti-fog coatings, microfluidic devices, and air humidity control.