Nd-Fe-B films prepared by low temperature process

Although sputtering-fabricated Nd-Fe-B films have been reported to achieve excellent magnetic properties, the films require an annealing process such as substrate heating and/or post annealing. This study focuses on Nd-Fe-B films' preparation by low temperature process. In detail, laser-induced forward transfer technique using two targets (target A: pulsed laser deposition-fabricated Nd-Fe-B films, target B: Nd-Fe-B sintered magnets) were conducted. Fundamental properties were examined for the films prepared by each target in the study.