Studies on RF Magnetron sputtered FTO/n-ZnO/p-NiO/AgNW transparent solar cells devices

This study utilized an RF magnetron sputtering system to deposit P-type NiO and N-type ZnO thin films on FTO glass substrates for use in transparent solar cell devices. By adjusting the argon flow rate and growth temperature during deposition, the films’ crystalline quality and optoelectronic properties were optimized. The NiO thin film exhibited a preferential orientation of (111) and an optical transmittance above 70% when deposited with an argon flow rate of 60 seem and a growth temperature of 200$^{\circ}C$. Silver nanowire (AgNW) was used as the top contact for the solar cell device and its electrical properties were analyzed. The resulting solar cell device with a structure of FTO/ZnO/NiO/AgNW exhibited promising electrical properties. This work demonstrates the potential of RF magnetron sputtering for high-quality thin film deposition in transparent solar cells.