Treatment time dependence of graphene oxide reduction by atomic hydrogen annealing

Treatment time dependence of graphene oxide (GO) reduction through atomic hydrogen annealing (AHA) was investigated using microwell (MW) substrates with circular wells of the order of µm. In AHA, atomic hydrogen produced on a W mesh is sprayed onto the sample surface. X-ray photoelectron spectroscopy of GO films before and after AHA confirmed that the GO films were reduced even at 100°C for 10 min. The Raman spectra show that the trend of the treatment time dependence of the reduction reaction differs between the suspended and supported regions.