Nanoscale Material-Specific Imaging Using an Extreme Ultraviolet Table-Top Light Source

Microscopy using extreme ultraviolet (EUV) light offers high potential for a broad range of applications ranging from semiconductor metrology to biological imaging, thanks to its nanoscale resolution and excellent material contrast [1]. Especially, photon penetration in the spectral region below the Silicon L-edge (>12.4 nm wavelength) allows for the investigation of micrometer-thick samples.