Study On E-Beam Induced Deposition with Gas Injection System

The Transmission electron microscopy (TEM) plays the most important role in observing and analyzing nano-scale samples of FinFET technology, which are mainly prepared by dual-beam system consisting both e-beam and I-beam columns. However, the lamella may include unexpected tier or elements caused by e-beam induced deposition with GIS during sample preparation. So, this paper intends to reveal the impurity from the deposition by utilizing standard TEM imaging with EDS method on a series experiment. Not only the components of the unexpected layer are uncovered, but the mechanism behind the phenomenon is illustrated. This study also proposed a brief workflow to overcome the side effects of beam induced deposition to achieve damage-free TEM samples.