Simulation of Projection Lithography Based on FDTD Method

In this paper, projection lithography of thick photoresist (SU-8) is simulated. The imaging theory of projection lens is studied, the mask and projection lens are modeled by vector model. Firstly, the whole algorithm flow is introduced. Vector imaging is used as the theoretical basis of this paper, and a projection lithography simulation model based on FDTD is established. At the same time, the effect of focal plane location on imaging is considered.