Highly Sensitive Metamaterial Plasmonic Sensor Based on Nanoimprinting

In this paper, we propose and experimentally demonstrate a highly sensitive plasmonic nanohole metasurface sensor using nanoimprinting and electron beam evaporation. A refractive index sensitivity of 516 nm/RIU has been successfully achieved. With the help of nanoimprinting, the proposed method exhibits intrinsic advantages in a simple fabrication process, high repeatability and low cost. Furthermore, the proposed method enables large-area fabrication, making the mass-production of the metamaterial sensor highly feasible.