Inverse-designed Ultra-compact Polarization Splitter–Rotator in 180 nm CMOS Process

We presented an inverse-designed ultra-compact polarization splitter–rotator (PSR) fabricated in a 180 nm commercial silicon photonic foundry. The proposed PSR displays a low insertion loss (<1.3 dB) and low crosstalk (<-17.8 dB) over 80 nm wavelength by measurements.