Metal gate MOSFETs with HfO/sub 2/ gate dielectric

We report for the first time electrical characterization of HfO/sub 2/ p- and n-MOSFETs with CVD TiN and PVD TaSiN gates respectively fabricated using conventional CMOS integration. Their performance is compared to PVD TiN-gated HfO/sub 2/ and SiO/sub 2/ n- and p-MOSFETs. To understand the issues with metal gates on high K gate dielectrics, PVD TiN MOSFETs were extensively characterized. At 10 nA//spl mu/m leakage, 0.345 mA//spl mu/m drive current was obtained from PVD TiN/HfO/sub 2/ p-MOSFETs. HfO/sub 2/ n-MOSFETs with metal gates show about 10/sup 4/ times reduction in gate leakage compared to poly/SiO/sub 2/ devices.