Optimisation of techniques for fabrication of nanopatterned substrates

Nanopatterned substrates have wide-ranging applications in fields stretching from the semiconductor industry to biomaterials. To improve the performance of these end-products, there is a need for scalable fabrication methods for these substrates with due consideration to their uniformity, yield and miniaturization. Here, we consider these substrates as seed layers on which nanomotors can be grown by glancing angle deposition. We discuss the requirements and consequent optimization of various methods and especially a soft lithography technique, which gives optimal outcomes.