Optical Properties of MoS2 Films Fabricated on Ceramic Substrates by Pulse Laser Deposition (PLD) Method

Films based on molybdenum disulfide deposited on ceramic substrates are of practical interest as optical coatings. Such coatings can be used in different instruments for measuring optical radiation energy parameters. The promise of the MoS
2
-based films on AlN substrates is based on their special optical properties and radiation resistance. In this paper is used an excimer KrF laser with a pulse duration of 30 ns, the wavelength of 248 nm and the target incidence angle of 45° to fabricate thin films. The experiments were carried out by varying the substrate temperature and chamber pressure. For the coatings deposited on textured substrates, the spectral reflectivity characteristic and the resistance to laser radiation under variable power density were measured. The study results revealed the main effects of the PLD method process parameters and parameters of the ceramic substrates on the optical properties and radiation resistance of the obtained coatings. The study determined the wavelength ranges of minimum reflection and threshold power density values.