Accelerated Capacitance Simulation of 3-D Structures With Considerable Amounts of General Floating Metals

Floating metals are special conductors introduced into conductor structures by design for manufacturing (DFM). They bring diffi-culty to accurate capacitance simulation. In this work, we aim to accelerate the floating random walk (FRW) based capacitance simu-lation for structures with considerable amounts of general floating metals. We first discuss how the existing modified FRW is affected by the integral surfaces of floating metals and propose an improved placement of integral surface. Then, we propose a hybrid approach called incomplete network reduction to avoid random transitions trapped by floating metals. Experiments on structures from IC and FPD design, which involves multiple floating metals and single or multiple master conductors, have shown the effectiveness of the proposed techniques. The proposed techniques reduce the computational time of capacitance calculation, while preserving the accuracy.