Study of Film Stress Controling of X-ray Reflective Lens

With the development of deep space exploration, pulsar navigation, and solar observation, there is an urgent need for low-weight X-ray telescopes. In this paper, the preparation process for a new generation of silicon-based X-ray mirrors is studied. Different thicknesses of Au and Cr/Au films were prepared by an electron beam evaporation method. The stress of the films was analyzed by the stress analyzer, and the stress pattern of different film structures were studied. The method for compensating film stress using SiO
2
layer is studied. It is concluded that comparing with Si/Au structure, the stress increased significantly when Cr layer is inserted in between Cr and Au layer. The stress raised with the increasing of SiO
2
layer thickness.