FPD Photomask ESD Sensitivity Testing Experiments for Various Design Concepts

ESD damage on photomask is well-known issue and still on-going problem when technology changes on semiconductor device and flat panel displays which are mostly simpler process of semiconductor device manufacturing processes. There are design ideas and concepts to increase ESD robustness of metal layers (chrome) on quartz as it still maintains same physical distance on design patterns. In this study, we’ll demonstrate how such combination design ideas can make ESD robustness differently and has physical damage threshold of metal layers between pure Cr design layers and alternative Cr+ design layers.