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Improvement in Short-Channel Effects of the Thin-Film Transistors Using Atomic-Layer Deposited In–Ga–Sn–O Channels With Various Channel Compositions | IEEE Journals & Magazine | IEEE Xplore

Improvement in Short-Channel Effects of the Thin-Film Transistors Using Atomic-Layer Deposited In–Ga–Sn–O Channels With Various Channel Compositions


Abstract:

In–Ga–Sn–O (IGTO) thin-film transistors (TFTs) were fabricated with channel lengths from 3 \mu \text{m} to 500 nm to investigate the short-channel effects (SCEs), in ...Show More

Abstract:

In–Ga–Sn–O (IGTO) thin-film transistors (TFTs) were fabricated with channel lengths from 3 \mu \text{m} to 500 nm to investigate the short-channel effects (SCEs), in which IGTO channel compositions were modulated during the atomic-layer deposition. The SCEs appearing in the IGTO TFTs were found to be manifested by increasing the In/Ga ratio of IGTO channel, showing typical channel composition dependence. Alternatively, small values of the channel-length reduction and contact resistance could be obtained to be 50 nm and 0.52 \text{k}\Omega , respectively, for the device using the IGTO channel with an In/Ga ratio of 1.7. Threshold voltage shifts of the IGTO TFT were estimated to be only +0.03 and +1.22 V under negative and positive gate-bias stress for 104 s, respectively, even with a channel length as short as 1 \mu \text{m} .
Published in: IEEE Transactions on Electron Devices ( Volume: 69, Issue: 10, October 2022)
Page(s): 5542 - 5548
Date of Publication: 18 August 2022

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