Experimental and theoretical studies on Mo/Si multilayers for extreme ultraviolet lithography using picosecond ultrasonics

Summary form only given. Mo/Si multilayer mirror coatings are a key enabling technology for extreme ultraviolet (EUV) lithography, a promising next-generation tool for the mass production of integrated circuits with design rules below 0.1 /spl mu/m. We have performed experimental and theoretical studies on the vibrational behavior of Mo/Si multilayers for EUV lithography using picosecond ultrasonics. Foundations have been laid for applying this technique in nondestructive characterization of multilayer coatings.