Sub-10 nm Nanogap Arrays for the Next-Generation Electronics

Nanogap electrodes (NGEs) with decreasing separations have received growing attention due to their potential as building blocks in the next-generation electronics including nanoelectronics and molecular electronics. Although various NGE-manufacturing methods have been developed and offer promising results, sub-10 nm nanogap arrays connected with macroscopically measurable pad electrodes have not been achieved without compromising high cost, low efficiency, limited materials, mass-fabrication compatibility, or/and failing to connect with macroscopic contacts, which hampers their widespread practical applications. Here, a novel fabricating method was proposed to successfully prepare macroscopically measurable NGE arrays with tunable tip-to-tip separations down to sub-10 nm. The fabrication process is simple, low-cost, lithography-free and CMOS-compatible, which would enable a breakthrough in fabrication of sub-10 nm NGE arrays and promote the development of NGE-related extended applications in various research fields.