Field emission photocathode array for high throughput lithography

Photo field emitters arrays of p-type silicon are investigated for the use in a new high throughput lithography concept called MAPPER. The first results of experiments with these emitter arrays are presented. The emission is relatively stable and uniform in vacuum of 10/sup -7/ mbar, and the emission can be switched on and off with a 633 10 mW laser when the emitter array is cooled down to liquid nitrogen temperature.