Electromigration Effect in Segmented Electrodes of Metallized Film Capacitors

Current-induced defects were observed in segmented electrodes of metallized film capacitors. Aperiodical current pulses of different amplitude and duration were applied to the experimental samples. It was found that thin demetallized lines (cracks) propagate in the direction of current streamlines. Scanning electron microscope was used to determine a width of investigated defects. Current density value needed to demetallized lines appear was calculated using numerical simulation in COMSOL Multiphysics software. It was proved that these defects are fast electromigration cracks.