Model IC Design Course to Optimize Higher Education Program (HEP) Usage

Every software can run with the support of a license. One of the IC design software service providers is Mentor Graphics with the HEP program. HEP consists of eight application categories. Two categories of them were used in this paper, namely IC Nanometer Design and Design, Verification and Test. There is twenty Software for HEP licenses in this paper: 9 software for IC Nanometer Design and 11 software for Design, Verification, and Test. The problem faced is the use of software for IC design previously only in analog IC design so that the use of the software is only 61.45%. Then it needs to use an optimized license. This paper aims to create a modeling course that can optimize the use of IC design software on the HEP license. Measurements were made related to the use of software for HEP licenses and comparing with one model and three-tiered models. The result is a 23.08% increase in the use of software in the HEP license.