Effects of Heating on the Performance of 70 nm Thick Domain Patterned Permalloy Incorporated RF Spiral Inductors

This paper discusses the effects of heating on the performance of aluminum spiral inductors incorporated with 70 nm Permalloy domain patterns. Spiral inductors with domain patterned Permalloy are heated to temperatures 373 K, 473 K and 573 K respectively. After heating till each temperature the wafer is cooled down to measure inductance and series resistance of spiral inductors. It is observed that shape and size of the pattern influences the variation of permeability of Permalloy with heating.