An extended plasma generator with hybrid excitation

The increasing requirements for uniformity of a plasma torch, and the necessity of holding of group technological processes, compel us to develop new layout designs of RF plasma generators. One perspective design is an RF generator based on a distributed amplifier. The circuit allows to carry out distributed power input in plasma reactor, and causes high longitudinal uniformity of the plasma. The design of the reactor unit allows the realization of so-called hybrid RF discharge (both capacitive and inductive types of discharges simultaneously) in the reactor space, and essentially, increase of radial uniformity of a plasma torch. Also, the multifrequency oscillation mode of this system promotes both increase of electronic efficiency of active elements and increase of energy contribution in a plasma reactor.