Substrate Temperature Optimization for Diamond Thin Film Synthesis using Hot-Filament Chemical Vapor Deposition

Chemical vapor deposition is a versatile process for large area good quality thin film synthesis. Hot-filament Chemical Vapor Deposition (HFCVD) is one among the cost effective methods that can produce good quality highly faceted polycrystalline diamond thin films. The physical parameters of the filaments, which are used to provide the activation energy, have a significant role in determining the temperature distribution and the gas density inside the reaction chamber. In the present work, the Finite Volume Method (FVM) is used to study the effect of the filament parameters of different grid filament configurations in optimizing the substrate temperature and determining the optimized filament parameters.