Highly uniform and reproducible vertical-cavity surface-emitting lasers grown by metalorganic chemical vapor deposition

Summary form only given. Metalorganic chemical vapor deposition (MOCVD) technology is increasingly recognized as a superior platform for growth of vertical-cavity surface-emitting lasers (VCSELs) because of its high throughput, low surface defect density, continuous compositional grading control, and the flexibility for materials and dopant choices. In this paper, we show that it is also capable of extremely high wafer uniformity and run-to-run reproducibility.