Development of patterned graphene transparent conductive film for solar cells application

We developed a method of patterning graphene by plasma etching to improve the performance of graphene transparent conductive film. We succeeded in patterning the graphene multilayer film into the porous shape of the mask by optimizing the plasma etching gas type, pressure and power. As the plasma irradiation time was lengthened, the transmittance became high and saturated at a transmittance corresponding to the aperture ratio of the mask. A possibility of independently controlling the optical and electrical properties of the graphene film by etching under appropriate conditions was indicated.