Permittivity as a Function of Temperature of PVDF/Graphene Films

This work presents a methodology to fabricate films, through combination of Polyvinylidene fluoride (PVDF) and Graphene (G) of composition 1 wt% and the behavior of the temperature dependence of the permittivity of this material. PVDF solution was prepared by solution casting and mixed with G using Dimethylformamide (DMF). Circular samples of 1.5 cm diameter and thickness around 50.5 μm were obtained of the PVDF/G film. The morphological characteristics of the PVDF/G films were evaluated by a scanning electron microscope JEOL (JMS-6360LV). Finally, the permittivity of PVDF/G films was tested at different frequencies in order to know their behavior to temperature changes. In addition, PVDF commercial films were used to comparative purposes. The dielectric response of the fabricated PVDF/G films was interesting because it showed higher temperature dependence than the PVDF films, however, this dependence was different for each frequency. It is worth mentioning that the permittivity behavior at 100 Hz showed stronger temperature dependence than the other measurements. This strong dependence makes this material suitable for temperature sensing or energy storage applications.