AlInN/GaN MIS-HEMTs with High Pressure Oxidized Aluminium as Gate Dielectric

AlInN/GaN metal insulator semiconductor high electron mobility transistor (MIS-HEMT) with high pressure oxidized aluminium as gate dielectric is investigated in this paper. The fabricated MIS-HEMT shows more than six orders of reduction in the gate leakage current in reverse bias and more than three orders of reduction in forward bias compared to the reference HEMT devices also fabricated on same substrates. A maximum drain current of 750 mA/mm was achieved due to improvement in the gate swing for MIS- HEMT. The MIS-HEMT devices also showed good improvement in the subthreshold slope and I
_D,ON
/I
_D,OFF
ratio compared to HEMT devices.