The First Compact Model to Determine $V_{T}$ Distribution for DG-FinFET Due to LER

We report the first compact model to estimate the
${V}_{T}$
distribution of double gate-FinFET due to line edge roughness. We derive closed-form expressions, representing the compact model, for: 1) mean and standard deviation of fin width (
${W}_{\text {fin}}$
) in terms of geometrical and variability parameters of the FinFET; 2)
${V}_{T}$
as a function of
${W}_{\mathrm {fin}}$
for uniform width fins; and 3)
${V}_{T}$
in tapered fins using percolation. The
${V}_{T}$
distribution produced from the compact model shows a good match with well-calibrated TCAD data and demonstrates an excellent accuracy (~3mV rms error) for a wide range of scaling and variability parameters. The model is simple, platform independent, and
$\sim {\text {10}}^{\text {4}}{\times }$
faster compared to TCAD. It enables intuitive understanding of design space for FinFET on the one hand, and accurate FinFET variability-aware circuits and system design on the other hand.