The Understanding of SiNR and GNR TFETs for Analog and RF Application With Variation of Drain-Doping Molar Fraction

The 1-D nanoribbon (NR) of monolayer materials has gained immense interest due to their unique properties qualitatively distinct from their bulk properties and the demand for nanoscale applications. In this paper, the quantum transport properties of two most prominent 2-D materials, i.e., silicene NR (SiNR) and a graphene NR (GNR) tunnel field-effect transistor (TFET) with the effect of different dopant molar fractions in the drain region are studied numerically using nonequilibrium Green's function formalism. In SiNR TFET, higher on-state current (I_ON) is observed due to wider tunneling energy window and high transmission probability of carriers. In order to observe the effect of variation of doping density in the drain region, we have studied analog figures of merit such as the transconductance (g_m), output resistance (r_o), transconductance generation factor (g_m/I_D), and the intrinsic gain (g_mr_o) for different molar fractions. Similarly, we have evaluated the RF performance of the SiNR and GNR TFETs as a function of cutoff frequency (f_T), gate capacitance (C_G), and transport delay (τ).