Lens thermal behavior based exposure process control for flat panel display lithographic tools

This paper presents a comprehensive approach to control flat panel display (FPD) lithographic tool exposure process based on projection lens thermal behavior. Lithographic tool can maintain enough process window and high throughput for large DOSE exposure on this control method. In some FPD lithographic process layers, the exposure tool would generate huge thermal aberration, such as focal plane and magnification drift, because of the large DOSE. This control method includes several technics such as high accuracy patterning quality prediction, high accuracy thermal aberration prediction, aberration correction and equipment process adaptive management. In exposure process, the lithographic tool can adjust the internal parameters and working sequences in real time to maintain the aberration level and tact time. Based on this method, the FPD lithographic tool is applicable for high resolution and high DOSE processes with high manufacturing efficiency.