Fabrication and evaluation of aluminum nano-wire grid polarizer array in two different structure types

Aluminum nano-wire grid structure based on stokes vector plays an important role in the polarization application technology. In this paper, we present the methods of fabricating aluminum nano-wire grid in a single direction structure and a four-orientation structure using EBL (electron beam lithography) and ICP-RIE (inductively coupled plasma-reactive ion etching). According to the request of visible light polarization, the grating's period was designed to 200nm. Based on the experimental measurement and simulation analysis, the extinction ratio of single direction nano-wire grid structure is higher than multi-orientation nano-wire grid structure in preparation of parameters under the same conditions. Two aspects were optimized to improve the performance of latter grating array structure.